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XUE Zhi-hao, SUN You-mei, #, CHANG Hai-long, LIU Jie, HOU Ming-dong, YAO Hui-jun, MO Dan, CHEN Yan-feng. Research on Fabrication Technology of Micropore Array in Silicon Using Electrochemical Etching[J]. Nuclear Physics Review, 2008, 25(3): 277-281. DOI: 10.11804/NuclPhysRev.25.03.277
Citation: XUE Zhi-hao, SUN You-mei, #, CHANG Hai-long, LIU Jie, HOU Ming-dong, YAO Hui-jun, MO Dan, CHEN Yan-feng. Research on Fabrication Technology of Micropore Array in Silicon Using Electrochemical Etching[J]. Nuclear Physics Review, 2008, 25(3): 277-281. DOI: 10.11804/NuclPhysRev.25.03.277
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Research on Fabrication Technology of Micropore Array in Silicon Using Electrochemical Etching

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  • The 3D structures in silicon are increasingly coming to use in many fields. For example, the high resolution Xray digital imaging detector can be made by coupling CCD and the scintillating screen which is made by the array trenches filled with CsI(Tl). In the present work, we explored the technology of etching microarray on the ntype silicon with high resistance. By studying the relative parameters of anisotropic etching of KOH and electrochemical etching of HF, the optimized concentration of HF was determined and the micropore array trenches with 200 μm in depth were realized. The results establish an experimental base for further fabrication of the scintillating screen.
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